Bibliothèque de L'IMIST/CNRST

This book reviews the advances and technologies used to produce microelectronic and optoelectronic devices from compound semiconductors. It provides an overview of the technologies necessary to grow bulk single-crystal substrates, grow hetero-or homoepitaxial films, and process advanced devices such as HBT's, QW diode lasers, et cetera.

Includes bibliographical references and index.

Bulk Crystal Growth -- MOCVD of Compound Semiconductor Layers -- Molecular Beam Epitaxy -- Physical and Chemical Deposition of Metals as Ohmic Contacts to InP and Related Materials -- Surface Processing of III-V Semiconductors -- Ion Implantation Induced Extended Defects in GaAs -- Passivation of GaAs and InP -- Wet and Dry Etching of Compound Semiconductors -- Rapid Isothermal Processing (RIP) -- Epitaxial Lift-Off for Thin Film Compound Semiconductor Devices -- Packaging -- Chemical, Structural and Electronic Characterization of Compound Semiconductor Surfaces and Interfaces by X-ray Photoelectron Spectroscopy and Diffraction Techniques -- Characterization of Compound Semiconductor Material by Ion Beams -- Optical Characterization of Compound Semiconductors -- Gallium Arsenide Microelectronic Devices and Circuits -- Optoelectronic Devices -- Acknowledgments -- References -- Index.

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