Bibliothèque de L'IMIST/CNRST

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Fundamentals of semiconductor manufacturing and process control par May, Gary S. Publication : [S.l.] Wiley-IEEE Press 2006 . 463 p. , A practical guide to semiconductor manufacturing from process control to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Control covers all issues involved in manufacturing microelectronic devices and circuits, including fabrication sequences, process control, experimental design, process modeling, yield modeling, and CIM/CAM systems. Readers are introduced to both the theory and practice of all basic manufacturing concepts. Following an overview of manufacturing and technology, the text explores process monitoring methods, including those that focus on product wafers and those that focus on the equipment used to produce wafers. Next, the text sets forth some fundamentals of statistics and yield modeling, which set the foundation for a detailed discussion of how statistical process control is used to analyze quality and improve yields. The discussion of statistical experimental design offers readers a powerful approach for systematically varying controllable process conditions and determining their impact on output parameters that measure quality. The authors introduce process modeling concepts, including several advanced process control topics such as run-by-run, supervisory control, and process and equipment diagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and management of overall manufacturing systems * Chapters include case studies, sample problems, and suggested exercises * Instructor support includes electronic copies of the figures and an instructor's manual Graduate-level students and industrial practitioners will benefit from the detailed exami?nation of how electronic materials and supplies are converted into finished integrated circuits and electronic products in a high-volume manufacturing environment. An Instructor's Manual presenting detailed solutions to all the problems in the book is available from the Wiley editorial department. An Instructor Support FTP site is also available. 24 cm. Date : 2006 Disponibilité : Exemplaires disponibles: La bibliothèque des sciences de l'ingénieur (1),

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Handbook of semiconductor manufacturing technology   Publication : Boca Raton CRC Press 2008 . 1 v. (various pagings) , Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on… Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand. 26 cm. Date : 2008 Disponibilité : Exemplaires disponibles: La bibliothèque des sciences de l'ingénieur (1),

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Microelectronic circuit design par Jaeger, Richard C. Publication : New York Mcgraw Hill 2011 . XXVI, 1334 p. , Richard Jaeger and Travis Blalock present a balanced coverage of analog and digital circuits; students will develop a comprehensive understanding of the basic techniques of modern electronic circuit design, analog and digital, discrete and integrated. A broad spectrum of topics are included in "Microelectronic Circuit Design" which gives the professor the option to easily select and customize the material to satisfy a two-semester or three-quarter sequence in electronics. Jaeger/Blalock emphasizes design through the use of design examples and design notes. Excellent pedagogical elements include chapter opening vignettes, chapter objectives, 'Electronics in Action' boxes, a problem-solving methodology, and 'Design Note' boxes. The use of the well-defined problem-solving methodology presented in this text can significantly enhance an engineer's ability to understand the issues related to design. The design examples assist in building and understanding the design process. 26 cm. Date : 2011 Disponibilité : Exemplaires disponibles: La bibliothèque des sciences de l'ingénieur (1),

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X-ray metrology in semiconductor manufacturing par Bowen, D. Keith Publication : Boca Raton CRC/Taylor and Francis 2006 . 279 pages 25 cm. Date : 2006 Disponibilité : Exemplaires disponibles: La bibliothèque des sciences de l'ingénieur (1),

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Demystifying switching power supplies / par Mack, Raymond A. Publication : . 1 online resource (xiv, 323 pages) : , Includes index. Disponibilité :  http://www.sciencedirect.com/science/book/9780750674454,

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